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PLANT PHYSIOLOGY , Vol 110, Issue 2 561-569, Copyright © 1996 by American Society of Plant Biologists
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WHOLE PLANT, ENVIRONMENTAL, AND STRESS PHYSIOLOGY |
Aluminum Interactions with Voltage-Dependent Calcium Transport in Plasma Membrane Vesicles Isolated from Roots of Aluminum-Sensitive and -Resistant Wheat Cultivars
J. W. Huang, D. M. Pellet, L. A. Papernik and L. V. Kochian
United States Plant, Soil and Nutrition Laboratory, United States Department of Agriculture-Agricultural Research Service, Cornell University, Ithaca, New York 14853
The role of Al interactions with root-cell plasma membrane (PM) Ca2+
channels in Al toxicity and resistance was studied. The experimental
approach involved the imposition of a transmembrane electrical potential
(via K+ diffusion) in right-side-out PM vesicles derived from roots of two
wheat (Triticum aestivum L.) cultivars (Al-sensitive Scout 66 and
Al-resistant Atlas 66). We previously used this technique to characterize a
voltage-dependent Ca2+ channel in the wheat root PM (J.W. Huang, D.L.
Grunes, L.V. Kochian [1994] Proc Natl Acad Sci USA 91: 3473-3477). We found
that Al3+ effectively blocked this PM Ca2+ channel; however, Al3+ blocked
this Ca2+ channel equally well in both the Al-sensitive and -resistant
cultivars. It was found that the differential genotypic sensitivity of this
Ca2+ transport system to Al in intact roots versus isolated PM vesicles was
due to Al-induced malate exudation localized to the root apex in
Al-resistant Atlas but not in Al-sensitive Scout. Because malate can
effectively chelate Al3+ in the rhizosphere and exclude it from the root
apex, the differential sensitivity of Ca2+ influx to Al in intact roots of
Al-resistant versus Al-sensitive wheat cultivars is probably due to the
maintenance of lower Al3+ activities in the root apical rhizosphere of the
resistant cultivar.
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