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Plant Physiol, March 2000, Vol. 122, pp. 657-666
Expression of Aluminum-Induced Genes in Transgenic Arabidopsis
Plants Can Ameliorate Aluminum Stress and/or Oxidative
Stress1
Bunichi
Ezaki,*
Richard C.
Gardner,
Yuka
Ezaki, and
Hideaki
Matsumoto
Research Institute For Bioresources, Okayama University, 2-20-1
Chuou, Kurashiki, Okayama 710-0046, Japan (B.E., H.M.); and School of
Biological Sciences, University of Auckland, Private Bag 92019, Auckland, New Zealand (R.C.G., Y.E.)
 |
ABSTRACT |
To examine the biological role of
Al-stress-induced genes, nine genes derived from Arabidopsis, tobacco
(Nicotiana tabacum L.), wheat (Triticum
aestivum L.), and yeast (Saccharomyces
cerevisiae) were expressed in Arabidopsis ecotype Landsberg.
Lines containing eight of these genes were phenotypically normal and
were tested in root elongation assays for their sensitivity to Al, Cd,
Cu, Na, Zn, and to oxidative stresses. An Arabidopsis
blue-copper-binding protein gene (AtBCB), a tobacco
glutathione S-transferase gene (parB), a tobacco
peroxidase gene (NtPox), and a tobacco GDP-dissociation inhibitor gene (NtGDI1) conferred a degree of resistance
to Al. Two of these genes, AtBCB and
parB, and a peroxidase gene from Arabidopsis
(AtPox) also showed increased resistance to oxidative stress induced by diamide, while parB conferred
resistance to Cu and Na. Al content of Al-treated root tips was reduced
in the four Al-resistant plant lines compared with wild-type Ler-0, as judged by morin staining. All four Al-resistant lines also showed reduced staining of roots with 2',7'-dichloro fluorescein diacetate (H2DCFDA), an indicator of oxidative stress. We conclude
that Al-induced genes can serve to protect against Al toxicity, and also provide genetic evidence for a link between Al stress and oxidative stress in plants.
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INTRODUCTION |
Al ions have a toxic effect on both plant and animal cells
(Kochian, 1995 ). It has been suggested that Al3+
ions enhance the peroxidation of phospholipids and proteins in cell
membranes (Cakmak and Horst, 1991 ; Yamamoto et al., 1997 ), but a range
of alternative toxicity mechanisms have also been proposed (Kochian,
1995 ). Exudation of Al-chelating organic acids such as malate, oxalate,
or citrate into the rhizosphere has been proposed as a tolerance
mechanism to avoid Al toxicity in many plants (Ryan et al., 1995 ).
Internal oxalate has also been reported to detoxify cytosolic Al by
chelation in an Al-accumulating plant (Ma et al., 1997 ). Recently,
overexpression of a bacterial citrate synthase gene in transgenic
plants was shown to confer Al tolerance (de la Fuente et al., 1997 ).
Chelation strategies are very useful, but combining them with
additional Al tolerance mechanisms within the plant would be expected
to provide more effective protection.
Over 20 genes induced by Al stress have been isolated from a range of
plant species, including wheat (Triticum aestivum L.) (Snowden and Gardner, 1993 ; Cruz-Ortega et al., 1997 ; Hamel et al.,
1998 ; Delhaize et al., 1999 ), tobacco (Nicotiana tabacum L.)
(Ezaki et al., 1995 , 1996 , 1997 ), and Arabidopsis (Sugimoto and
Sakamoto, 1997 ; Richards et al., 1998 ). Most of the Al-induced genes
seem to be general stress genes that are induced by a range of
different plant stresses, including low phosphate (Ezaki et al., 1995 ),
other metal toxicities (Snowden et al., 1995 ; Sugimoto and Sakamoto,
1997 ), wounding (Snowden et al., 1995 ), pathogen infection (Cruz-Ortega
et al., 1997 ; Hamel et al., 1998 ), or oxidative stress (Sugimoto and
Sakamoto, 1997 ; Richards et al., 1998 ). Some of the induced genes are
well known as anti-oxidation enzymes (e.g. glutathione
S-transferase, peroxidase, and superoxide dismutase). It
has therefore been proposed that there are common mechanisms for gene
induction between Al toxicity and oxidative stress (Richards et al.,
1998 ). The biological role of Al-induced genes in plants is unclear. By
analogy with other stress genes, the genes may play a role in
protecting cells against Al stress, but experimental evidence on this
point is lacking. Recently, we expressed 11 plant Al-induced genes in
yeast (Saccharomyces cerevisiae) cells and showed that two
of these, the tobacco GDP-dissociation inhibitor (GDI) gene
(NtGDI1) and the gene encoding the Arabidopsis blue copper-binding (BCB) protein (AtBCB), conferred Al
resistance in yeast cells (Ezaki et al., 1999 ). Overexpression of
another Al-induced gene encoding the wheat phosphatidylserine synthase enzyme also gave Al resistance in yeast (Delhaize et al., 1999 ).
We describe the construction of transgenic Arabidopsis lines expressing
nine Al-induced genes, as well as results of sensitivity tests for Al
stress and for oxidative stresses by monitoring root growth. The
results suggest that expression of four of the Al-induced genes can
ameliorate Al toxicity and that three confer protection against
oxidative stress.
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MATERIALS AND METHODS |
Plant Material and Growth Conditions
Arabidopsis ecotype Landsberg erecta (Ler-0) was used
for transformation. All Arabidopsis plants were grown under fluorescent illumination (approximately 50 µE m 2
s 1, 16 h of light and 8 h of
darkness) at 22°C. A modified Murashige and Skoog (MS) medium
(Murashige and Skoog, 1962 ) containing MS salts, B5 vitamins,
and 10 g L 1 Suc, which was adjusted to pH
5.7, was used for transformation and kanamycin screening. Another
modified MS medium, 1/6 MS solution, in which Suc was 10 g
L 1, but MS salts and B5 vitamins were 6×
diluted, was used for various sensitivity tests in this study. The pH
of the medium was adjusted to 4.0 for all sensitivity tests.
Construction of Transgenic Arabidopsis Lines
The cDNA fragments containing each Al-induced gene were inserted
between the cauliflower mosaic virus 35S promoter and the OCS
terminator of pART7 and then cloned into the NotI site of pART27 (Gleave, 1992 ). Constructed plasmids were listed in Table I. All of these constructs were
transformed to Agrobacterium tumefaciens LBA4404 to get
kanamycin-resistant lines. Transformation of Arabidopsis by A. tumefaciens was performed by the vacuum infiltration method
described by Bechtold et al. (1993) . T1
transgenic lines were selected on plates containing 1% (w/v)
agar, 200 mg L 1 timentin, and 75 mg
L 1 kanamycin. The kanamycin-resistant
seedlings were transferred to soil and grown to maturation.
Screening of seeds for kanamycin-resistant progeny was
carried out in the same way.
Al Stress and Various Stresses for Plants
Screening for Al resistance was performed according to a
vertical-mesh-transfer (VMT) technique developed by Murphy and Taiz (1995) . This plate assembly consisted of a 3-mm-thick plastic plate,
three squares of 1-mm-thick chromatography paper (3MM CHR, Whatman,
Maidstone, UK), and a square of nylon mesh (30-µm mesh). All
of these materials were cut to 5- × 5-cm squares. The nylon mesh and
chromatography sheets were saturated with the 1/6 MS medium and then
set on the plastic plate in this order. Sterilized seeds were incubated
at 4°C for 4 d and then plated in a line on the center of the
nylon mesh. The VMT plates were inclined at an angle of more than 80°
in a sterilized plant growth rack. Twenty milliliters of 1/6 MS medium
was poured into the racks (350 mL volume) to support plant growth.
After 5 d of growth, the nylon mesh carrying the young seedlings
(now with 1- to 1.5-cm-long roots) was transferred to a second VMT
plate on which three new chromatography sheets had been saturated with
1/6 MS medium supplemented with various concentration of metal ions or
peroxides. This new VMT plate was rotated 180° with the roots
pointing upward, placed in the growth rack, and incubated for a further
2 d. Root growth (the length between the root apex and bending
point) of 20 plants selected on the basis of seed availability was
measured for each treatment group during the 2-d treatment. Root growth
in each treatment was calculated relative to the control treatment.
Microscopic Observations
Localization of Al ions in roots was determined by staining with
morin (Sigma, St. Louis), according to the method described by Tice et
al. (1992) . The formation of peroxides such as
H2O2 in the root regions
was visualized by H2DCFDA (Molecular Probes, Eugene, OR) as described by Behl et al. (1994) . A fluorescent microscope (model MPM800, Carl Zeiss, Oberkochen, Germany) was used for observation.
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RESULTS |
Construction of Transgenic Arabidopsis Lines Carrying
Al-Induced Genes
Larsen et al. (1996) reported differences in Al sensitivity
between ecotypes of Arabidopsis, with Ler-0 being more sensitive than
Columbia (Col-0). We tested these two ecotypes using the gravity
bending, root elongation assay (Fig. 1).
Ler-0 always showed better root growth in the absence of Al ions (about
1.5 times longer than Col-0), but was more sensitive to Al than Col-0. Root growth of these two ecotypes was inhibited by increasing the Al
concentration. A more severe inhibition was observed in Ler-0,
especially by 100 to 300 µM Al treatments. We concluded that the more sensitive Ler-0 would be a more useful recipient ecotype
for monitoring the effect of potential Al-resistant genes.

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Figure 1.
Relative root growth of two ecotypes of
Arabidopsis in Al stress measured by the gravity bending assay.
Relative growth (expressed as a percentage of root growth in the
absence of Al) was compared between Ler-0 ( ) and Col-0 ( ). Error
bars represent SE values (n = 20). The
average growth of Ler-0 and Col-0 roots over 2 d were 10.6 and 6.1 mm, respectively.
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Nine Al-induced genes, listed in Table I (genes are identified by
previously used designations or by a five-letter code), were chosen for
expression in plants. Transformation of Arabidopsis produced 22 to 80 independent kanamycin-resistant transgenic lines for each
gene. To determine the number of T-DNA insertions into the plant
genome, 20 kanamycin-resistant lines for each gene were tested for
their segregation ratios in the T2 generation.
Approximately 45% to 85% of the tested lines showed ratios of 3:1
(kanamycin-resistant:kanamycin-sensitive seedlings) indicative of
single locus insertions in the genome. Five T2
lines showing single insertions were selected for each gene and
northern-blot hybridization analysis was carried out. There was
considerable variation in transcript levels between lines and between
genes (Fig. 2). Lines containing the
wali5, AtBPI, AtBCB, and tobacco
peroxidase (NtPox) genes generally expressed transcript at
high levels, and high-expressing lines could be identified for the
parA, parB, and HSP150 genes. At the
other end of the scale, the AtPox and NtGDI1
genes were poorly expressed in all the lines. Homozygous
T2 plants were identified by screening kanamycin
segregation ratios in their T3 generations; for
each transgene we obtained two to four independent lines that showed high gene expression. Most lines were phenotypically normal and showed
no significant differences in root growth compared with Ler-0. However,
lines carrying the AtBPI gene showed poor root growth and
were not included in subsequent characterizations.

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Figure 2.
Expression of the Al-induced genes in transgenic
Arabidopsis lines. Total RNA was extracted from seedlings of each
transgenic line, applied to an agarose gel (20 µg for
wali5, AtBPI, AtBCB,
AtPox, and parA lines, and 10 µg for
the parB, NtPox, NtGDI1,
and HSP150), and stained with ethidium bromide (bottom
part of each figure). DIG-labeled DNA probes were prepared by PCR using
each cloned coding region as a template and hybridized to the filters
(top part). The numbers above each lane correspond to individual
transgenic lines with single-locus inserts of each construct. Thus, for
wali5 we analyzed expression of lines 3, 8, 10, 13, and
14. The highest expressing lines for each construct were chosen and
homozygous seeds were obtained for phenotypic analysis (e.g.
wali5, lines 8, 10, and 14; parB, lines
3, 7, and 9). Northern-blot analyses using the total RNA extracted from
Ler-0 as control were also performed, and low or undetectable levels of
transcript were seen for all the genes (data not shown).
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Sensitivity to Al Stress
As a preliminary screen for Al resistance, one transgenic line
containing each gene was used in a root-elongation assay at three Al
concentrations (Fig. 3A). The clearest
differences between lines were seen at 200 µM Al.
Statistical analyses (Welch's t test and Student's
t test) revealed that four transgenic lines, those
expressing AtBCB, parB, NtPox, or
NtGDI1, showed significantly higher relative root growth
(P < 0.01) than the Ler-0 plants or plants containing
the binary vector pART27 only (Fig. 3A). The other three transgenic
lines carrying the wali5, AtPox, or
parA genes showed growth that was not significantly
different from controls. The transgenic line of the HSP150
gene showed an intermediate growth between the two groups. At 100 and
300 µM Al, there was no difference in relative
root growth for any of the tested lines.

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Figure 3.
Al resistance of transgenic lines by the gravity
bending assay. A, One line was selected from each group of transgenic
lines and tested in four concentrations of Al (0, 100, 200, and 300 µM) at pH 4.0 for 2 d. Results (white bar, 100 µM; gray bar, 200 µM; black bar, 300 µM) are shown as percent root growth compared with 0 µM Al for each line, as in Figure 1. The transgenic lines
tested were: pART27 (3-11), wali5 (8-12),
AtBCB (5-1), AtPox (4-1),
parA (10-1), parB (3-1),
NtPox (6-2), NtGDI1(5-11), and
HSP150 (14-12). Transgenic lines were labeled with
nomenclature pART27 (3-11), where the first number refers to the
transgenic line (see Fig. 2) and the second number refers to the
particular homozygous seed from each line. Values that are
significantly different from the controls (P < 0.01) are indicated by asterisks. B, Variation of Al sensitivity among
transgenic lines. Two to four independent transgenic lines containing
selected genes were exposed to 0 or 200 µM Al and
relative root growth was estimated. Error bars represent SE
values (n = 20). The average growth rates of Ler-0
roots over 2 d were 9.7 and 10.2 mm in Fig. 3, A and B,
respectively; control values for the transgenic lines ranged from 84%
to 112% and 78% to 108% of these values, respectively.
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In a second Al sensitivity test, all independent transgenic lines
containing the genes AtBCB, parB,
NtPox, NtGDI1, and HSP150 were exposed
to 200 µM Al (Fig. 3B). Control lines carrying
the vector pART27 showed similar sensitivity as Ler-0 for Al treatment. Statistical analyses revealed significant differences in relative root
growth at 200 µM Al between the Ler-0 control
and all of the individual lines containing the four genes
AtBCB, parB, NtPox, and
NtGDI1 (P < 0.01). There was no significant
difference between individual lines carrying each transgene in the
level of Al resistance they conferred, suggesting that the resistance
phenotypes of these lines are derived from expression of the
transgenes. The relative resistance conferred by the four transgenes
has been confirmed by more than three independent experiments. The two
lines expressing the HSP150 gene did not show a significant
difference from Ler-0 in relative growth at P < 0.05, suggesting that overexpression of the yeast HSP150 gene in
Arabidopsis is not sufficient to cause resistance to Al stress.
Sensitivity to Other Metal Stresses and to Oxidative Stresses
Dose-dependent growth inhibition curves for Ler-0 were determined
for a range of metal ion stresses using the root-elongation assay.
Levels that caused approximately 50% inhibition of root growth were:
50 µM for Cd2+, 20 µM
for Cu2+, 100 mM for
Na+, and 200 µM for
Zn2+ (data not shown). None of the transgenic
lines showed altered resistance to Cd or Zn stresses. However, the
lines carrying the parB gene showed higher root growth than
Ler-0 or pART27 transgenic lines in both 100 mM
Na and 20 µM Cu stress (Fig.
4, A and B).

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Figure 4.
Resistance of transgenic lines to other stresses.
A, 100 mM NaCl; B, 20 µM CuSO4;
C, oxidative stress generated by diamide (gray bar, 1 mM;
black bar, 1.5 mM). We present only those results for
transgenic lines showing a higher relative growth than Ler-0. Results
are shown as the percent root growth compared with control treatment
for each line, as in Figure 1. Error bars represent SE
values (n = 20). The average growth of Ler-0 roots
was 16.2 mm over 2 d, and the control values for the transgenic
lines ranged from 83% to 104% of this value.
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Sensitivity to three different oxidative stresses,
H2O2, diamide, or methyl
viologen, was also examined to determine whether the Al-induced genes
can confer resistance to these oxidative stresses in plants. In Ler-0,
concentrations of 1 mM
H2O2, 1 mM diamide, or 15 µM methyl viologen each gave approximately
50% inhibition of root growth (data not shown). No Al-induced genes conferred resistance to
H2O2 or methyl viologen.
However, transgenic lines with the AtBCB, AtPox,
or parB genes showed a higher relative growth than Ler-0 and
pART27 lines in both 1 and 1.5 mM diamide (Fig.
4C). The sensitivity tests for Cu, Na, and diamide were repeated two or
three times for each transgenic line and similar results were obtained.
There were also no significant differences between individual lines
carrying each transgene in the level of resistance conferred for each
stress, suggesting that the resistance phenotypes of these lines are
derived from expression of the transgenes.
Estimation of Oxidative Stress Using a Fluorescent Indicator
To characterize the difference in diamide sensitivity between
Ler-0 and the three resistant lines in more detail, the roots were
examined microscopically after staining with
H2DCFDA, which has been used as a
high-sensitivity indicator to the formation of peroxides such as
H2O2 and lipid
hydroperoxides (Behl et al., 1994 ). Untreated roots of Ler-0, as well
as those of all transgenic lines, had very low fluorescent signals in
the tip region. With increasing concentrations of diamide, stronger
H2DCFDA-dependent fluorescent signals could
be detected in roots of Ler-0 (Fig. 5A,
1-4). Similar staining was also seen in roots treated with 1 mM H2O2 (Fig.
5A, 5), indicating that H2DCFDA is a useful
indicator for oxidative stress in plants.

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Figure 5.
Microscopic observations of roots of Ler-0 and
transgenic lines. A, H2DCFDA-stained roots after diamide
treatment. 1 to 5, Ler-0 with various treatments for 5 h; 1, non-treated (control); 2, 0.5 mM diamide; 3, 1 mM diamide; 4, 1.5 mM diamide; 5, 1 mM H2O2. 6 to 9, Transgenic lines
with 1 mM diamide treatment for 5 h: 6, AtBCB (5-1); 7, AtPox (4-1); 8, parB (3-1); 9, NtPox (6-2). B,
Morin-stained roots after Al stress. 1, 2, and 3 are Ler-0 plants: 1, 0 µM Al for 5 h; 2, 50 µM; and 3, 100 µM. All the remaining plants were treated with 100 µM Al for 5 h. 4, wali5
(8-12); 5, AtPox (4-1); 6, parA
(10-1); 7, parB (3-1); 8, NtGDI1
(5-11); 9, HSP150 (14-12); 10, AtBCB
(5-1); 11, NtPox (6-2). C, H2DCFDA-stained
roots after Al stress. 1 and 2, Ler-0 plants: 1, 50 µM Al
for 5 h; 2, 100 µM Al. All of the remaining plants
were treated with 100 µM Al for 5 h. 3, AtBCB (5-1); 4, parB (3-1); 5, NtPox (6-2); 6, NtGDI1 (5-11); 7, HSP150 (14-12). Ten-day-old roots directly exposed to
1/6 MS media containing diamide (0, 1, and 1.5 mM),
H2O2 (1 mM), or Al (0, 50, or 100 µM) for 5 h were used for observations; the bar
represents 200 µm.
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Three diamide-resistant transgenic lines were also stained with
H2DCFDA after 1 mM diamide treatment,
and two of them expressing AtBCB and AtPox showed
clearly lower fluorescent signals in their root tip region (compare
Fig. 5A, 6-8 with Fig. 5A, 3). On the contrary, a signal strength
similar to that of Ler-0 was detected in the NtPox
transgenic line (Fig. 5A, 9), which showed diamide sensitivity in the
root elongation assay. These results confirm that oxidative stress
caused by diamide was reduced in the these resistant lines.
Localization of Al Ions and Reactive Oxygen Species Induced in Root
Tips by Al Treatment
Morin fluorescence has been used to detect the localization of Al
in plant tissue (Tice et al., 1992 ; Larsen et al., 1996 ). To
characterize the phenotype of the transgenic lines in more detail,
roots of Ler-0 or transgenic lines were directly exposed to 1/6 MS
medium containing Al ions for 5 h and then stained with morin.
Root tips (a zone approximately 0-1 mm from the root apex in
Arabidopsis) were analyzed, since they are the tissues initially targeted by Al in plants. Negligible levels of fluorescence signal were
seen in untreated roots of Ler-0, but increasing fluorescent signals
could be seen in root tips treated with 50 and 100 µM Al
for 5 h (Fig. 5B, 1-3). All eight transgenic lines of Arabidopsis were compared for the strength of their morin signal at 100 µM Al.
The tested lines were classified into three groups. The first group,
expressing wali5, AtPox, and parA,
showed almost the same fluorescence as Ler-0 (Fig. 5B, 4-6). A second
group, expressing parB, NtGDI1 and
HSP150, showed an intermediate level of morin staining (Fig.
5B, 7-9). The final group, expressing AtBCB and NtPox, had significantly lower signals in their roots (Fig.
5B, 10 and 11). In particular, these latter two transgenic lines had considerably less fluorescent signal in their root tip region (approximately 0-0.5 mm from root apex) than in Ler-0. The four Al-resistant lines all had reduced morin staining compared with Ler-0.
However, there were differences in their relative morin staining that
were not reflected in differences in Al resistance, e.g. the
HSP150 transgenic line, which could not demonstrate an improved Al resistance, showed considerably reduced morin staining.
To characterize the relationship between Al stress and oxidative
stress, roots of Ler-0 were treated with Al and then stained with
H2DCFDA. Higher concentrations of Al (50 and 100 µM) caused stronger fluorescent signals (Fig. 5C, 1 and
2). Staining was more intense in the region back from the root tip, as
well as in the root cap cells. These results are consistent with the
idea that Al stress induces the formation of reactive oxygen species in
Arabidopsis root tips. All eight transgenic lines were also stained
with H2DCFDA after treatment with 100 µM Al for 5 h. Three transgenic lines, expressing
the wali5, AtPox, and parA genes, showed no difference in signal pattern and intensity compared with
Ler-0 (data not shown). There was significantly lower signal in the
transgenic line carrying the NtPox gene (Fig. 5C,
5); this lower signal was seen in both root cap cells and throughout
the whole root apex compared with Ler-0. Lower signals were also seen in the root tip region (0-0.5 mm behind the root cap) in the
AtBCB, parB, and HSP150 transgenic
lines (Fig. 5C, 3, 4, and 7); however, in these three lines, the
staining intensities farther back in the root were similar to those
seen in Ler-0. A somewhat different pattern of staining was seen in the
transgenic line expressing NtGDI1, with a more even
distribution of H2DCFDA staining in whole root
tip region. However, the overall intensity of signal was slightly lower
than Ler-0 (Fig. 5C, 6).
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DISCUSSION |
These results demonstrate that overexpression of any one of four
Al-induced genes can confer Al resistance. The levels of resistance
conferred were not very high, and differences in resistance were only
observed over a narrow window of Al concentrations. Nonetheless, the
differences in relative root growth were significant and reproducible.
Furthermore, lines expressing these four genes showed lower Al content
and less oxidative damage than Ler-0 in their root tip regions. The
findings provide the first evidence (to our knowledge) that Al-induced
genes can protect cells against Al toxicity in plants. We did not
analyze levels of protein expression in transformants using specific
antibodies. These experiments may show that some of the differences in
Al resistance were due to differences in protein levels.
Plant genes induced by a particular stress often serve to protect
against that stress. This approach has been successful for oxidative
stress (Gupta et al., 1993 ; Camp et al., 1996 ; Veena et al., 1999 ),
salt stress (Veena et al., 1999 ), heat stress (Lee et al., 1995 ; Prandl
et al., 1998 ), and pathogen attack (Alexander et al., 1993 ). We
have previously shown that inactivation of the HSP150 gene
in yeast increases Al sensitivity, demonstrating that this Al-induced
gene normally plays a protective role against Al stress (Ezaki et al.,
1998 ). Therefore, our demonstration that overexpression of Al-induced
plant genes can confer Al resistance is perhaps not surprising.
Three predictions can be made from these results. First, the diversity
of genes acting to promote resistance suggests that the genes operate
via different mechanisms. If this is the case, increased levels of
resistance could be obtained by combinations of transgenes in the same
line. Second, our demonstration that Al resistance can be improved by
enhanced expression of Al-induced genes suggests that Al-induced genes
contribute to the natural polygenic variation in Al resistance found in
many inheritance tests (Carver and Ownby, 1995 ). We predict that some
Al-induced genes will map to quantitative trait loci affecting Al
resistance. Third, it is likely that many of the Al-induced genes,
perhaps including some of the four for which overexpression did not
confer resistance, will prove to be necessary for Al resistance when knockout mutations in each gene are analyzed in Arabidopsis. For example, disruption of the yeast Al-induced gene HSP150
reduced both Al and oxidative stress resistance (Ezaki et al., 1998 ), but did not promote resistance to either Al or oxidative stress when
overexpressed in yeast (B. Ezaki, R.C. Gardner, Y. Ezaki, and H. Matsumoto, unpublished data). It is likely that Al-induced genes
contribute to the Al-sensitive mutants found in both Arabidopsis (Larsen et al., 1996 ) and yeast (Schott and Gardner, 1997 ).
Indeed, in the case of yeast, a large proportion of Al-sensitive
strains showed altered stress tolerance (Schott and Gardner,
1997 ).
Morin staining of the Al-treated roots indicated that the four
Al-resistant transgenic lines accumulated less Al than Ler-0 in their
root tip region, particularly the 0.5-mm apical tip which includes the
cell division and cell elongation zones. Interpretation of these
results is somewhat complicated. One explanation might be that all four
genes acted to confer Al resistance by reducing cellular Al content in
root tips (e.g. by decreasing uptake or by increasing efflux). There is
some support for this explanation. The AtBCB gene is likely
located in the cell walls and appears to confer Al resistance in yeast
by decreasing uptake, while the NtGDI1 gene product likely
plays a role in intracellular vesicle transport and appears to act in
yeast by increasing Al efflux (Ezaki et al., 1999 ). We have no data as
to the precise mechanism of action for the other two genes that
conferred Al resistance in this study, the tobacco anionic peroxidase
(NtPox) and glutathione S-transferase
(parB) genes. However, it is likely that they both encode
intracellular proteins whose cellular role involves detoxifying reactive oxygen species, since it has been reported that the total activity of peroxidase and other anti-peroxidation enzymes increases during Al treatment (Cakmak and Horst, 1991 ). It is less likely that
these two genes also act directly by reducing Al content in the cell,
but there is a possibility that they act to restrict lipid peroxidation
in cell membrane regions of these transgenic plants. These cell
membranes may be able to keep the influx of Al ions into the cytosol at
a reduced level. An alternative explanation of the lower morin staining
in the resistant lines may be that Al uptake into the root tip occurs
as the result of Al toxicity rather than being a cause of it. Thus, an
increase in resistance via any mechanism would be reflected in reduced
Al content in root tips. However, it should be noted that the
correlation between Al resistance and morin staining was not complete.
Similarly, lines expressing HSP150 showed lower morin
staining than Ler-0, but were not significantly different in Al
resistance. It is possible that these differences may reflect the
non-quantitative nature of our estimate of morin staining or a lack of
sensitivity of the root elongation assay used here for measuring Al
resistance. However, we consider it more likely that the two assays are
in fact measuring different parameters, and that any correlation between them may be coincidental. Larsen et al. (1996) noted changes in
Al content in eight Al-sensitive mutant lines, which correlated with Al
sensitivity in some cases but not others.
Our results suggest that the fluorescent stain
H2DCFDA is an indicator of oxidative stress in
Arabidopsis root tips. The increase in H2DCFDA
staining seen with increasing Al confirms previous suggestions that Al
induces oxidative stress in Arabidopsis roots (Sugimoto and Sakamoto,
1997 ; Richards et al., 1998 ). These results are consistent with the
idea that oxidative stress (e.g. Al-induced lipid peroxidation) is the
primary cause of Al stress. However, they do not rule out the idea that
oxidative stress is a result of Al toxicity rather than a cause.
H2DCFDA staining suggested that there is some
reduction of oxidative stress in the root tips of the four Al-resistant
transgenic lines, especially in the NtPox lines. This result
provides confirmation of the Al resistance of these lines. However,
there were significant spatial differences in the staining patterns
observed in the various transgenic lines, suggesting that the situation
may be quite complex; additional analysis of the changes in reactive
oxygen species under Al stress in these lines is necessary.
Our results also provide genetic evidence supporting previous
suggestions (Cakmak and Horst, 1991 ; Sugimoto and Sakamoto, 1997 ;
Richards et al., 1998 ) that Al stress and oxidative stress are strongly
linked in plants. We have shown that overexpression of three Al-induced
genes in plants conferred oxidative stress resistance. In particular,
overexpression of the parB gene simultaneously conferred
resistance to both Al and oxidative stresses. Therefore, at least some
of the genes induced during Al and oxidative stresses play protective
roles against both stresses. We found similar results with yeast (Ezaki
et al., 1998 ).
Recently we overexpressed a selection of 11 Al-induced genes in yeast,
including all nine of the genes expressed here in Arabidopsis. Only two
of the genes, AtBCB and NtGDI1, conferred Al
resistance to yeast (Ezaki et al., 1999 ). Both genes also conferred Al
resistance to Arabidopsis, suggesting that there is an overlap in the
protection mechanisms that operate in yeast and plants. There are
several possible reasons why the genes encoding anti-peroxidation
enzymes, NtPox and parB, conferred resistance in
Arabidopsis but not in yeast. One simple explanation is that the plant
gene products are not expressed in an active form in yeast, or that the
overexpression of the transcript in yeast had no effect on their enzyme
activities. Alternatively, yeast and Arabidopsis may differ in their
regulation of oxidative stress pathways or in which anti-oxidant enzyme
systems are induced in response to Al stress.
 |
ACKNOWLEDGMENTS |
We would like to thank Keith D. Richards, Sanae Rikiishi, and
Masako Kawamura for their technical assistance, and Dr. Walter J. Horst
and Dr. Yoko Yamamoto, as well as other anonymous reviewers, for
comments concerning the manuscript.
 |
FOOTNOTES |
Received July 20, 1999; accepted November 5, 1999.
1
This work was supported by the Program for
Promotion of Basic Research Activities for Innovative Biosciences, the
New Zealand Foundation for Research Science and Technology (no.
96-AGR-03-5253), by the Core Research for Evolutional Science and
Technology of Japan Science and Technology Corporation, by a
Grant-in-Aid for Scientific Research (B) and Creative Basic
Research of the Ministry of Education, Science, Sports and Culture, by
the Ohara Foundation for Agricultural Sciences, and by the Joint
Research Project under the Japan-Korea Basic Scientific Cooperation
Program of Japan Society for Promotion of Science.
*
Corresponding author; e-mail bezaki{at}rib.okayama-u.ac.jp; fax
86-434-1249.
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